Sputter Source

• Our sputter sources are designed for use with 1" dia or 2" dia targets (thin foils to ¼" thick targets). Quick change of magnets, clamping ring and the ground shield prepares these sources for 1" dia targets.
• This is very useful for targets which are very expensive as a 2" dia target may be beyond the budget of the customer.
• The change from 2" to 1" takes not more than 10 minutes.
• The magnet housing is designed to prevent the magnets from getting heated which allows high power use and also easy replacement of magnets.
• The magnets used are high power NdB Fe magnets.
• The source is fitted on a flange using an O ring feed through which allows the distance of target from substrate to be adjusted.

• There is a shutter mounted on the flange to make the source and shutter a single unit.
• The shutter rod can be adjusted for length.
• The metallic housing at the back has water connection (typically for 6mm OD plastic pipes) and an N (female) connector.
• A locking nut prevents the source from being pulled in by vacuum.
• An adjustable ground shield and a locking ring nut allow mounting of different thickness of targets.
• Removable chimneys also can be provided for confining the sputtered material.
• Gas inlet right at the target surface can be provided through this chimney. This means this chimney also can work like a gas ring.
• The max length of the target from the vacuum side of the flange face can be as per customer requirements.